“EUV Lithography: Energy & Geopolitics in Transition”

In an article in the manufacturing trade publication Industry Today, Marshall Gerstein Partner and patent attorney Stephen Kudla gives an overview of how energy demands and global uncertainty are reshaping the future of Extreme Ultraviolet (EUV) lithography. This essential technology drives the next generation of semiconductor manufacturing, making it possible to produce smaller and more powerful chips in everything from smartphones to servers.

“EUV systems are notoriously energy-intensive, raising serious concerns as manufacturers face rising energy costs and pressure to meet stricter environmental standards,” Stephen writes in the publication. “Simultaneously, geopolitical tensions—particularly involving China—are pushing companies to rethink where and how they manufacture and protect their innovations. Companies intending to develop/refine EUV systems should consider shifting their patent strategies toward energy efficiency and filing in jurisdictions that offer both regulatory stability and long-term manufacturing security.”

Read Stephen’s column in Industry Today.